Negative ion sputtering ion source

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	Negative ion sputtering ion s...	IRB: Bijenička 54, HR-10000 Zagreb. tel: +385 (0)1 4561-111, fax: 4680-084, PR: 4571-269, mail: info@irb.hr
... Projects FP6 RBI-AF Negative ion sputtering ion source
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Up (FP6 RBI-AF)

(v) Negative ion sputtering ion source

Before this project the 6MV accelerator was equipped with the home-made sputtering ion source which has been already in use for more than a decade (position 3 at figure below). It is simple and easy to operate, but it has disadvantages (frequent maintenance, low currents). In addition, irrespective of this project we obtained some ‘SNICS’ ion source components. Under this project we completed the 'new' sputtering ion source. This required design and installation of new high-voltage platform (S) to accomodate this ion source (position 1 at the figure below) and the existing 'alphatros' ion source (position 2 at the figure below). In addition, we purchased and assembled all the missing components to complete the system, including ion beam optical elements (the injection accelerating tube, high voltage extraction and focusing electrodes), high voltage and other power supplies and control devices, and vacuum system components (vacuum tubes, flanges, pumps).