Cms-18 magnetron sputtering system for thin film preparation

Cms-18 magnetron sputtering system for thin film preparation

Market opportunity

CMS-18 thin film deposition system offers wide possibilities for preparation of known and new materials and structures in the form of thin films.

Four magnetron sources allow preparation of various materials (metal, semiconductor, dielectric, metastable etc.) in a wide range of compositions and structures using deposition, codeposition, sequential deposition and reactive deposition processes.

Materials prepared on CMS-18 can be used in producing hi-tech products, in particular for medical implants and equipment, platinum resistant thermometers, tools with improved mechanical features and tools for working in corrosive mediums.

Technical description

Process chamber (SS 316) 45 cm dia, 50 cm height, with base pressure of about 10-8 mbar. Loadlock chamber for substrate manipulation without breaking vacuum in the main chamber. Four TORUS®3 magnetrons, powered by four separate power supplies - two DC magnetrons (0,5 KW DC & 1,0 KW DC) + 2 RF magnetrons (2 x 600 W RF).  One high-strength magnet assembly mounted for sputtering of ferromagnetic materials. Substrate holder accommodates up to 6" diameter wafers. Features: adjustable target-substrate distance, rotation (up to 40 rpm), heating up to 800°C or cooling at LN2 temperaturein situ, DC or RF bias. System can also work with two additional gases for reactive deposition - chemical synthesis during deposition.

Nikola Radić,

Senior Scientist +385 1 468 0224
Nikola Radić

Deposition processes: single source deposition (simple or composite target), codeposition from two or more sources, sequential deposition by shutter operation and reactive deposition with two additional gases.

Service offer

Rudjer innovations Ltd offers the preparation of thin films and related expertise of Rudjer Boskovic Institute scientists to all companies with commercial interest.