Ion beam irradiation
Contacts
Sample irradiation with ion beams can be performed using all ion species that can be generated by the available negative ion sources of the RBI accelerator system (sputtering source, direct extraction duoplasmatron, and Alphatross). The most commonly used ions include H, He, Li, B, Be, C, O, Si, etc.
Ion energies can range from several tens of keV (directly from the ion sources) to between 400 keV and several MeV (from one of the tandem accelerators). Maximum ion beam currents can reach up to 1 μA, depending on the efficiency of the ion source, as well as the energy and charge state of the ions.
Typical irradiation areas are up to 100 mm². When using the ion microprobe, irradiation areas can be reduced to the micrometer scale. In this mode, it is also possible to perform deterministic irradiation, i.e., implantation of single ions at precisely defined positions on the sample with a spatial resolution of approximately 1 μm.
On the dual-beam experimental line, simultaneous irradiation of samples with two ion beams (originating from two separate accelerators) is also possible.