Silicon nanostructures for advanced applications will be focused on nanostructural silicon thin films for advanced applications. The Low Pressure Chemical Vapor Deposition (LPCVD) and Physical Vapor Deposition (PVD) developed at Ivanda’s group will be used for deposition thin films and wires of silicon, silicon reach oxide, silicon reach nitride, amorphous silicon, polycrystalline silicon, doping with boron, phosphorus, erbium and europium on flat silicon, quartz glass and alumina substrates as well as on silica microspheres. The porous silicon will be prepared by anodisation process. The structural, optical, electrical and transport properties will be investigating.