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Materijali na bazi silicija za fotoniku

The research include the production and the characterization of novel silicon based
materials for optoelectronics, namely silicon rich oxides (nitrides), silicon oxide /silicon rich oxide (nitride) multilayers, nanocrystalline silicon and europium doped silicon nanocrystalls
in silica layers. All of these new materials will be studied in combination with silica
microspheres. These thin films on silica microspheres will be investigated in order to
examine different non-linear properties under the high laser light intensity excitation
conditions. The Stimulated Raman Scattering and optical amplification being the most
promising for the construction of silicon-based laser will be searched on this silicon based
thin films deposited on silica microspheres. The project includes cooperation between the
IFN-CNR in Trento and the Ruđer Bošković Institute in Zagreb under the 150.000 euros
value research project.

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